Shanghai, China

Guohua Lu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Honeywell International Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guohua Lu. Retrieved from https://idiyas.com/inventor/guohua-lu-eo57iknm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Guohua Lu - Innovator in Gas Separation Technology

Introduction

Guohua Lu is a notable inventor based in Shanghai, China. He has made significant contributions to the field of gas separation technology. His innovative approach has led to the development of a unique gas separation cartridge.

Latest Patents

Guohua Lu holds 1 patent for his invention of a gas separation cartridge. This cartridge features a housing with an inlet port for air samples, a top cover, and an upper cavity with individual chambers containing chemicals or absorbents. Each chamber has openings at both ends, allowing for efficient gas separation. The bottom cover includes a lower cavity and separate openings for air samples, ensuring that both processed and unprocessed air can be managed effectively. The base of the cartridge is designed with an exit port for easy access.

Career Highlights

Guohua Lu is currently employed at Honeywell International Inc., where he continues to work on innovative solutions in gas separation. His expertise and dedication to research have positioned him as a valuable asset in his field.

Collaborations

Guohua has collaborated with notable colleagues, including Aimin Su and Huafang Zhou. Their combined efforts contribute to advancements in technology and innovation within their industry.

Conclusion

Guohua Lu's work in gas separation technology exemplifies the impact of innovative thinking in solving complex problems. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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