Guo-Xin Hu

Title: Guo-Xin Hu: Innovator in Optical Proximity Correction

Introduction

Guo-Xin Hu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of optical proximity correction (OPC) with his innovative methods and devices. With a total of 2 patents, Hu continues to push the boundaries of technology in semiconductor manufacturing.

Latest Patents

Hu's latest patents include an "OPC operation method" and an "OPC operation device." The OPC operation method involves several steps, starting with obtaining a mask layout. If the mask layout contains at least one defect hotspot, at least one partial area pattern is extracted from the mask layout based on the defect hotspot. A machine learning model is then utilized to analyze the local area pattern, resulting in the development of at least one OPC strategy. This strategy is implemented to correct the mask layout effectively.

Another notable patent is the "Method of forming a pattern of doped region." This method begins with providing a device layout pattern that includes both a gate layout pattern and a doped region layout pattern to a computer system. The device layout pattern is subsequently divided into multiple sub-regions, each having different pattern densities of the gate layout pattern. An optical proximity correction calculation is performed on the doped region layout pattern in each sub-region, leading to the formation of corrected sub-doped region layout patterns. These corrected patterns are then combined to create a final corrected doped region layout pattern, which is outputted onto a mask through the computer system.

Career Highlights

Guo-Xin Hu is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work focuses on enhancing the precision and efficiency of semiconductor manufacturing processes through innovative OPC techniques.

Collaborations

Hu collaborates with notable colleagues, including Yuh-Kwei Chao and Chung-Yi Chiu, who contribute to his research and development efforts in the field of optical proximity correction.

Conclusion

Guo-Xin Hu's contributions to optical proximity correction demonstrate his commitment to advancing semiconductor technology. His innovative patents and collaborative efforts position him as a key figure in the industry.