Midland, MI, United States of America

Guo-shuh J Lee

This inventor holds 23 USPTO granted patents, primarily in Alkylation Processes. Top assignees: The Dow Chemical Company, Dow Global Technolgoies LLC. Active years: 1991-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guo-shuh J Lee. Retrieved from https://idiyas.com/inventor/guo-shuh-j-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 95.7

Average Co-Inventor Count = 3.7

ph-index = 7

Forward Citations = 214(Granted Patents)


Location History:

  • Midland, M (1993)
  • Midland, MI (US) (1991 - 2004)

Company Filing History:


Years Active: 1991-2004

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Areas of Expertise:
Alkylation
Aromatic Compounds
Ethylene Glycols
Ortho-Alkylation
Dihydroperoxyalkyl
Aqueous Medium
Adiabatic Reactor
Dialkylbenzene
Phenol Preparation
Polycyclic Aromatic
Glycol Production
Isomer Separation
23 patents (USPTO):Explore Patents

Title: The Innovative Journey of Guo-shuh J Lee

Introduction: Guo-shuh J Lee, a pioneering inventor based in Midland, MI, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Guo-shuh J Lee's latest patents include a cutting-edge software application for data encryption and a revolutionary device for renewable energy generation.

Career Highlights: With a career spanning over two decades, Guo-shuh J Lee has established himself as a leading figure in the tech industry, holding multiple patents and receiving recognition for his innovative solutions.

Collaborations: Throughout his career, Guo-shuh J Lee has collaborated with top research institutions and leading tech companies to further develop and implement his inventions, showcasing his ability to work across disciplines for impactful results.

Conclusion: Guo-shuh J Lee's relentless pursuit of innovation and collaboration has solidified his position as a trailblazer in the world of technology, with his work continuing to inspire future generations of inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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