Guo-Dung Chen

Title: Guo-Dung Chen: Innovator in X-ray Reflectometry

Introduction

Guo-Dung Chen is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of nanotechnology, particularly through his innovative work in X-ray reflectometry. With a total of six patents to his name, Chen has established himself as a key figure in advancing measurement techniques for nanostructures.

Latest Patents

One of Guo-Dung Chen's latest patents is an X-ray reflectometry apparatus and method for measuring three-dimensional nanostructures on flat substrates. This invention addresses the challenges faced when applying X-ray reflectometry (XRR) to samples with complex nanostructures. The apparatus utilizes convergent X-ray with a long wavelength, which is greater than that from a copper anode of 0.154 nm and less than twice the characteristic dimensions along the film thickness direction. This design allows for effective measurements of samples with limited areas and scattering volumes, making it particularly useful for intricate nanostructures.

Career Highlights

Throughout his career, Guo-Dung Chen has worked with notable organizations, including the Industrial Technology Research Institute and Innovative Nanotech Incorporated. His experience in these institutions has contributed to his expertise in the field of nanotechnology and X-ray reflectometry.

Collaborations

Chen has collaborated with several professionals in his field, including Wei-En Fu and Bo-Ching He. These partnerships have further enhanced his research and development efforts in innovative measurement techniques.

Conclusion

Guo-Dung Chen's work in X-ray reflectometry has significantly impacted the characterization of nanostructures. His inventions continue to pave the way for advancements in nanotechnology and measurement methodologies.