This inventor holds 1 USPTO granted patent. Top assignee: Rca Inc.. Active years: 1985.
Company Filing History:
Years Active: 1985
Title: Gunther Harbeke: Innovator in Optical Reflectance Technology
Introduction
Gunther Harbeke is a notable inventor based in Affoltern, Switzerland. He has made significant contributions to the field of optical reflectance methods, particularly in determining the surface roughness of silicon films. His innovative approach has implications for various materials used in semiconductor technology.
Latest Patents
Harbeke holds a patent for an "Optical reflectance method for determining the surface roughness of silicon films." This patent describes a method for the rapid and simultaneous determination of surface roughness and structure of silicon films deposited by chemical vapor deposition. The method utilizes the magnitude of reflectance at specific wavelengths to provide quantitative measures of film surface roughness. This technique can also be applied to evaluate other materials such as metals, alloys, and silicides.
Career Highlights
Gunther Harbeke has worked with Rca Inc., where he has been able to apply his expertise in optical technologies. His work has contributed to advancements in the semiconductor industry, enhancing the understanding of surface properties of various materials.
Collaborations
One of his notable collaborators is Michael T Duffy. Together, they have explored innovative solutions in the field of optical reflectance and its applications in semiconductor technology.
Conclusion
Gunther Harbeke's contributions to optical reflectance methods have paved the way for advancements in the evaluation of surface roughness in semiconductor materials. His work continues to influence the industry and inspire future innovations.