Williamsburg, VA, United States of America

Gunter Leupke

This inventor holds 1 USPTO granted patent. Top assignee: Vanderbilt University. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gunter Leupke. Retrieved from https://idiyas.com/inventor/gunter-leupke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2005

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Gunter Leupke: Innovator in Semiconductor Processing Metrology

Introduction

Gunter Leupke is a notable inventor based in Williamsburg, VA (US). He has made significant contributions to the field of semiconductor processing metrology. His innovative work has led to the development of a unique patent that addresses critical challenges in the industry.

Latest Patents

Gunter Leupke holds a patent for a "Contactless optical probe for use in semiconductor processing metrology." This invention provides a method and device for determining first and second band offsets at a semiconductor/dielectric heterointerface. The technology involves exposing the heterointerface to incident photons from a light source, utilizing a detector to generate a signal by detecting emitted photons, and incorporating an element to change the energy of incident photons to monitor the band offsets.

Career Highlights

Gunter Leupke is affiliated with Vanderbilt University, where he continues to advance research in semiconductor technologies. His work has been instrumental in enhancing the accuracy and efficiency of semiconductor processing.

Collaborations

Gunter has collaborated with esteemed colleagues, including Norman H. Tolk and Wei Wang, contributing to various research initiatives and projects.

Conclusion

Gunter Leupke's innovative contributions to semiconductor processing metrology exemplify the impact of dedicated research and development in technology. His patent reflects a significant advancement in the field, showcasing his commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…