This inventor holds 2 USPTO granted patents and 5 published patent applications and 2 EPO patents. Top assignee: Samsung Electronics Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Guk Hee Kim: Innovator in Semiconductor Technology
Introduction
Guk Hee Kim is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the reliability and efficiency of semiconductor devices.
Latest Patents
Guk Hee Kim's latest patents include innovative designs for semiconductor devices. One patent describes a semiconductor device that features a substrate with a first and second surface, along with a first and second source/drain pattern. This design incorporates a unique air gap structure that improves the connection between various components. Another patent focuses on a semiconductor device that enhances the reliability of connections between a through via and a lower wiring layer. This invention includes a first substrate, an active pattern, and a gate electrode, among other components, to ensure optimal performance.
Career Highlights
Throughout his career, Guk Hee Kim has worked with leading companies in the technology sector, including Samsung Electronics Ltd. and Samsung Electronics Co., Ltd. His experience in these organizations has allowed him to develop cutting-edge technologies that push the boundaries of semiconductor design.
Collaborations
Guk Hee Kim has collaborated with notable colleagues in the field, including Min Chan Gwak and Anthony Dongick Lee. These partnerships have fostered innovation and contributed to the advancement of semiconductor technology.
Conclusion
Guk Hee Kim's contributions to semiconductor technology are noteworthy, with his patents reflecting a commitment to improving device reliability and performance. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile