This inventor holds 2 USPTO granted patents and 1 published patent application, plus 1 CIPO patent and 2 EPO patents. Top assignee: Omya International Ag. Active years: 2017.
Company Filing History:
Years Active: 2017
Title: Guillermo Bluvol: Innovator in Coating Technologies
Introduction
Guillermo Bluvol is a notable inventor based in Gretzenbach, Switzerland. He has made significant contributions to the field of coating technologies, particularly through his innovative patents. With a total of 2 patents, Bluvol has established himself as a key figure in the development of high-performance slurries.
Latest Patents
His latest patents focus on the formulation of aqueous slurries that enhance coating color concentrations. One of his inventions, titled "Coarse pigment addition and high solids slurries for higher coating colour concentrations," describes an aqueous slurry comprising natural ground calcium carbonate. This slurry features a percentage by weight of particles with a diameter of less than 5.0 µm ranging from 98.5% to 90%, and particles with a diameter of less than 2.0 µm from 96% to 80%. The invention also specifies that the slurry has a solids content of more than 78 wt%, making it a valuable contribution to the industry.
Career Highlights
Throughout his career, Guillermo Bluvol has worked with prominent companies such as Omya International AG and Omya Development AG. His experience in these organizations has allowed him to refine his expertise in coating technologies and contribute to various innovative projects.
Collaborations
Bluvol has collaborated with notable professionals in his field, including Michael Kässberger and Patrick A C Gane. These partnerships have further enriched his work and expanded the impact of his inventions.
Conclusion
Guillermo Bluvol's contributions to coating technologies through his patents demonstrate his innovative spirit and commitment to advancing the industry. His work continues to influence the development of high-performance slurries, showcasing the importance of innovation in this field.