Company Filing History:
Years Active: 2015
Title: The Innovative Contributions of Guillaume Wahli
Introduction
Guillaume Wahli is a notable inventor based in Ecublens, Switzerland. He has made significant contributions to the field of chemical vapor deposition technology. His work focuses on enhancing the efficiency and quality of thin film deposition processes.
Latest Patents
Wahli holds a patent for a "Parallel plate reactor for uniform thin film deposition with reduced tool foot-print." This capacitive-coupled parallel plate plasma enhanced chemical vapor deposition reactor features a gas distribution unit integrated into an RF electrode, which includes a gas outlet. The design of the parallel plate reactor allows for the production of layers with high thickness homogeneity and quality. The reactor's gas distribution unit is equipped with a multiple-stage showerhead, enabling independent adjustment of gas distribution and emission profiles.
Career Highlights
Throughout his career, Wahli has worked with prominent companies in the industry, including Roth & Rau AG and Meyer Burger AG. His experience in these organizations has contributed to his expertise in the field of plasma enhanced chemical vapor deposition.
Collaborations
Wahli has collaborated with talented individuals such as Joachim Mai and Benjamin Strahm. These partnerships have further enriched his work and innovations in the field.
Conclusion
Guillaume Wahli's contributions to the field of thin film deposition technology are noteworthy. His innovative patent and collaborations with industry professionals highlight his commitment to advancing this area of research. His work continues to influence the development of efficient deposition techniques.