The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
Jul. 09, 2010
Joachim Mai, Nobitz, DE;
Benjamin Strahm, Giez, CH;
Guillaume Wahli, Ecublens, CH;
Arthur Buechel, Ruggell, LI;
Thomas Schulze, Oelsnitz/Erzgeb., DE;
Joachim Mai, Nobitz, DE;
Benjamin Strahm, Giez, CH;
Guillaume Wahli, Ecublens, CH;
Arthur Buechel, Ruggell, LI;
Thomas Schulze, Oelsnitz/Erzgeb., DE;
Roth & Rau AG, Hohenstein-Ernstthal, DE;
Abstract
A capacitive-coupled parallel plate plasma enhanced chemical vapor deposition reactor includes a gas distribution unit that is integrated in an RF electrode and is formed with a gas outlet. The parallel plate reactor is configured so that layers with high thickness homogeneity and quality can be produced. The capacitively coupled parallel plate plasma enhanced vapor deposition reactor has gas distribution unit with a multiple-stage showerhead constructed in such a way that it provides an independent adjustment of gas distribution and gas emission profile of the gas distribution unit.