Company Filing History:
Years Active: 2025
Title: The Innovative Mind of Guillaume Landie
Introduction
Guillaume Landie is a notable inventor based in Lumbin, France. He has made significant contributions to the field of technology, particularly in the area of photomask generation. His innovative approach combines advanced processing techniques with neural networks, showcasing his expertise in the field.
Latest Patents
Guillaume Landie holds a patent for a "Device and method for generating photomasks." This patent describes a method that includes the compression of an image comprising first patterns by transforming the image into a first representation formed of two-point elements. The method also involves executing an inference operation on the first representation using a neural network to generate a second representation formed of two-point elements. Furthermore, the method includes generating a lithographic mask based on the decompression of the second representation. This innovative approach highlights his ability to integrate cutting-edge technology into practical applications.
Career Highlights
Throughout his career, Guillaume Landie has worked with prominent companies in the technology sector. He has been associated with STMicroelectronics, specifically at the Crolles 2 facility, as well as STMicroelectronics France. His experience in these organizations has allowed him to develop and refine his skills in semiconductor technology and innovation.
Collaborations
Guillaume has collaborated with talented individuals such as Charlotte Beylier and Mauricio Garcia Suarez. These partnerships have likely contributed to his success and the advancement of his projects.
Conclusion
Guillaume Landie is a distinguished inventor whose work in photomask generation exemplifies the intersection of technology and innovation. His contributions to the field are noteworthy, and his patent reflects his commitment to advancing technological solutions.