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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12455502 B1

PDFFull Text
Date of Patent:
Oct. 28, 2025

Filed:

Nov. 09, 2022

Device and method for generating photomasks

Applicants:

Stmicroelectronics (Crolles 2) Sas, Crolles, FR;

Stmicroelectronics France, Montrouge, FR;

Inventors:

Charlotte Beylier, Meylan, FR;

Mauricio Garcia Suarez, Santiago, CL;

Pascal Urard, Theys, FR;

Guillaume Landie, Lumbin, FR;

Assignees:

STMicroelectronics (Crolles 2) SAS, Crolles, FR;

STMicroelectronics France, Montrouge, FR;

Attorney:

Crowe & Dunlevy LLC

Primary Examiner:

Leigh M Garbowski

Int. Cl.
CPC ...
G06F 30/27 (2020.01); G03F 1/70 (2012.01); G03F 7/00 (2006.01); G06F 30/30 (2020.01); G06F 30/398 (2020.01); G06N 3/094 (2023.01); G06F 119/18 (2020.01); G06N 3/0455 (2023.01); G06N 3/0475 (2023.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 7/705 (2013.01); G06F 30/27 (2020.01); G06F 30/398 (2020.01); G06N 3/094 (2023.01); G06F 2119/18 (2020.01); G06N 3/0455 (2023.01); G06N 3/0475 (2023.01);
Abstract

The present description concerns a method that includes the compression, by a processor, of an image comprising first patterns by transforming the image into a first representation formed of two-point elements. The method also includes the execution, by a neural network, of an inference operation on the first representation to generate a second representation formed of two-point elements. The method further includes the generation of a lithographic mask based on the decompression of the second representation.

Find Patent Forward Citations

Beylier, Charlotte. (2025). Device and method for generating photomasks (U.S. Patent No. 12455502). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12455502

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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