Le Mans, France

Guillaume Failleau

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Université Du Maine. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guillaume Failleau. Retrieved from https://idiyas.com/inventor/guillaume-failleau

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Guillaume Failleau

Introduction

Guillaume Failleau is a notable inventor based in Le Mans, France. He has made significant contributions to the field of thermal measurement technology. His innovative work has led to the development of a unique device for measuring heat flux.

Latest Patents

Guillaume Failleau holds a patent for a "Device for measuring a heat flux." This invention involves a thermopile composed of multiple thermojunctions of a distributed type. The device features a first and a second ceramic substrate, with the first substrate containing cavities separated by ceramic spacers. The thermopile is strategically placed on a planar face of the first substrate, ensuring accurate measurements of heat flux.

Career Highlights

Guillaume Failleau is affiliated with Université Du Maine, where he continues to advance his research and development efforts. His work in the academic environment allows him to explore innovative solutions and contribute to the scientific community.

Collaborations

He has collaborated with notable colleagues such as Lionel Camberlein and Etienne Gaviot. These partnerships have fostered a collaborative environment that enhances the quality and impact of their research.

Conclusion

Guillaume Failleau's contributions to thermal measurement technology exemplify the spirit of innovation. His patent for a heat flux measuring device showcases his expertise and commitment to advancing scientific knowledge.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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