Company Filing History:

10 out of 6,662

Hoechst Aktiengesellschaft

Years Active: 1991-1999

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14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 5998084 - Radiation-sensitive recording material for the production of (1999-12-07),

2. 5853482 - Method and apparatus for applying a coating solution (1998-12-29),

3. 5656086 - Coating device for applying thin wet films (1997-08-12),

4. 5576137 - Matted, radiation-sensitive recording material and printing plate (1996-11-19),

5. 5443638 - Device for generating a subatmospheric pressure (1995-08-22),

6. 5436106 - Process for the production of a color test image using quinone diazide (1995-07-25),

7. 5417181 - Coating device (1995-05-23),

8. 5348833 - Colored positive-working quinone diazide photosensitive recording (1994-09-20),

9. 5269873 - Apparatus for peeling-off a film laminated on a carrier material (1993-12-14),

10. 5217535 - Coating device for cast-coating webs (1993-06-08),

11. 5147690 - Process and apparatus for drying a liquid film applied to a moving (1992-09-15),

12. 5136973 - Process and device for electrostatically spraying a liquid coating onto (1992-08-11),

13. 5046264 - Method and apparatus for continuously drying boards coated on both sides (1991-09-10),

14. 4999927 - Process and device for drying a liquid layer applied to a moving carrier (1991-03-19),

Title: Guenter Hultzsch: Innovator in Radiation-Sensitive Materials

Introduction

Guenter Hultzsch is a notable inventor based in Wiesbaden, Germany. He has made significant contributions to the field of radiation-sensitive materials, holding a total of 14 patents. His work has been instrumental in advancing technologies used in planographic printing plates.

Latest Patents

Among his latest patents is a radiation-sensitive recording material designed for the production of positive-working planographic printing plates. This innovative material comprises an aluminum support and a radiation-sensitive layer coated thereon. Another significant patent involves a method and apparatus for applying a coating solution to a running substrate using a slot die. This apparatus features two die lips that form a gap, which defines an outlet for releasing the coating solution. The design includes multiple manifold chambers that communicate with both a gas feeder and a coating solution feeder, allowing for adjustable coating widths based on gas pressure.

Career Highlights

Throughout his career, Guenter Hultzsch has worked with prominent companies such as Hoechst Aktiengesellschaft and Agfa-Gevaert AG. His experience in these organizations has contributed to his expertise in the development of advanced materials and technologies.

Collaborations

Guenter has collaborated with notable colleagues, including Hermann Idstein and Andreas Elsaesser. These partnerships have fostered innovation and the exchange of ideas in the field of radiation-sensitive materials.

Conclusion

Guenter Hultzsch's contributions to the field of radiation-sensitive materials and his extensive patent portfolio highlight his role as a leading inventor. His work continues to influence advancements in printing technologies and materials science.

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