Tokyo, Japan

Guemju Cha

This inventor holds 1 USPTO granted patent. Top assignee: Zeon Corporation. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guemju Cha. Retrieved from https://idiyas.com/inventor/guemju-cha-lt01j4oi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2012

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Guemju Cha: Innovator in Electric Double Layer Capacitors

Introduction

Guemju Cha is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of electric double layer capacitors. His innovative approach has led to advancements in the production methods of these essential components.

Latest Patents

Guemju Cha holds a patent for a "Method for producing electrode for electric double layer capacitor." This method involves mixing a particulate elastomer and a carbonaceous material in a powdery form to create a powdery mixture. The process includes a step of dry-forming the resultant mixture to form an electrode layer. This technique allows for the production of high-capacity electric double layer capacitors through simplified steps and high productivity. He has 1 patent to his name.

Career Highlights

Cha is currently employed at Zeon Corporation, where he continues to work on innovative solutions in the field of capacitors. His expertise and dedication have made him a valuable asset to the company.

Collaborations

One of his notable coworkers is Hidekazu Mori, with whom he collaborates on various projects related to capacitor technology.

Conclusion

Guemju Cha's contributions to the field of electric double layer capacitors demonstrate his innovative spirit and commitment to advancing technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…