Hangzhou, China

Guangyue Shen

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Zhejiang Dahua Technology Co., Ltd.. Active years: 2021-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guangyue Shen. Retrieved from https://idiyas.com/inventor/guangyue-shen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2022

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2 patents (USPTO):Explore Patents

Title: Innovations by Guangyue Shen

Introduction

Guangyue Shen is a notable inventor based in Hangzhou, China. He has made significant contributions to the field of image acquisition and exposure control technologies. With a total of 2 patents, his work reflects a commitment to advancing imaging systems.

Latest Patents

Guangyue Shen's latest patents include "Systems and methods for image acquisition" and "Systems and methods for exposure control." The first patent describes a system that determines the exposure time of a visible light sensor based on ambient light conditions. This system allows for simultaneous capture of visible light and infrared images, ultimately generating a target image by fusing these two types of images. The second patent focuses on exposure control, detailing methods to adjust exposure parameters based on target frame brightness values and corresponding exposure modes.

Career Highlights

Guangyue Shen is currently employed at Zhejiang Dahua Technology Co., Ltd., where he continues to innovate in imaging technologies. His work has contributed to the development of advanced systems that enhance image quality and control.

Collaborations

Some of his notable coworkers include Runfa Pan and Quan Chen, who collaborate with him on various projects within the company.

Conclusion

Guangyue Shen's contributions to imaging technology through his patents demonstrate his expertise and innovative spirit. His work continues to influence advancements in the field, showcasing the importance of research and development in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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