Guanglu Chen

Title: Innovations of Guanglu Chen in Semiconductor Manufacturing

Introduction

Guanglu Chen is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of dummy gate structures in semiconductor devices.

Latest Patents

Guanglu Chen holds a patent titled "Method for making HKMG dummy gate structure with amorphous/ONO masking structure and procedure." This patent describes a method for manufacturing a dummy gate structure, which includes several key steps. The process involves forming a dummy gate oxide layer and a dummy gate material layer on a semiconductor substrate sequentially. It also includes forming an ONO structure on the dummy gate material layer and a top amorphous silicon layer on the ONO structure. The method further details the etching processes that are crucial for creating the dummy gate structure.

Career Highlights

Guanglu Chen is affiliated with the Chinese Academy of Sciences, where he has been able to apply his expertise in semiconductor technology. His innovative approach has led to advancements in the manufacturing processes used in the industry. His contributions are recognized for their potential to improve the performance of semiconductor devices.

Collaborations

Guanglu Chen has worked alongside notable colleagues such as Chunlong Li and Junfeng Li. Their collaborative efforts have contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Guanglu Chen's work exemplifies the importance of innovation in semiconductor manufacturing. His patent and contributions to the field highlight his role as a key inventor in advancing technology. His efforts continue to influence the industry positively.