Gregory M Amico

Title: Gregory M Amico: Innovator in Plasma Deposition Technology

Introduction

Gregory M Amico is a notable inventor based in Gilroy, California. He has made significant contributions to the field of plasma deposition technology, particularly in improving step coverage in thin film applications. His innovative methods have the potential to enhance various manufacturing processes in the semiconductor industry.

Latest Patents

Amico holds a patent for a method titled "Pulsed plasma deposition etch step coverage improvement." This patent focuses on methods for in-situ deposition and treatment of a thin film to achieve improved step coverage. The process involves forming a dielectric layer on patterned features of a substrate by exposing it to a gas mixture of precursors while utilizing pulsed RF power to generate plasma. This innovative approach aims to enhance the quality and efficiency of thin film applications.

Career Highlights

Gregory M Amico is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment industry. His work at Applied Materials has allowed him to apply his expertise in plasma technology to develop advanced solutions for clients in the semiconductor sector.

Collaborations

Amico has collaborated with several talented individuals in his field, including Vinayak Veer Vats and Hang Yu. These collaborations have contributed to the advancement of technologies related to plasma deposition and etching processes.

Conclusion

Gregory M Amico's contributions to plasma deposition technology exemplify the innovative spirit of modern inventors. His work continues to influence the semiconductor industry, paving the way for advancements in manufacturing processes.