Gregory L Murray

Title: Innovations of Gregory L. Murray in EUV Lithography

Introduction

Gregory L. Murray is a notable inventor based in Potsdam, NY (US). He has made significant contributions to the field of lithography, particularly in the development of methods to enhance the manufacturing of EUV lithography mirrors. His innovative approach has led to the creation of a patented method that addresses critical challenges in the industry.

Latest Patents

Murray holds a patent for a "Method to avoid striae in EUV lithography mirrors." This patent outlines a process for manufacturing an EUV lithography element mirror, which includes sagging a plate of glass material to create an EUV mirror blank. The method further involves polishing the top face of the EUV mirror blank to produce a polished EUV mirror. This innovative technique is crucial for improving the quality and performance of EUV lithography elements.

Career Highlights

Gregory L. Murray is associated with Corning Incorporated, a leading company in materials science and manufacturing. His work at Corning has allowed him to focus on advancing technologies that are essential for modern lithography applications. His expertise in this area has positioned him as a valuable asset to the company and the industry.

Collaborations

Murray has collaborated with notable colleagues, including Michael E. Best and Claude L. Davis, Jr. These partnerships have fostered an environment of innovation and have contributed to the successful development of advanced lithography technologies.

Conclusion

Gregory L. Murray's contributions to EUV lithography through his patented methods demonstrate his commitment to innovation in the field. His work not only enhances the manufacturing process but also sets a foundation for future advancements in lithography technology.