The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2004
Filed:
Aug. 30, 2001
Michael E. Best, Ogdensburg, NY (US);
Claude L. Davis, Jr., Painted Post, NY (US);
Mary J. Edwards, Ogdensburg, NY (US);
Thomas W. Hobbs, Canton, NY (US);
Gregory L. Murray, Potsdam, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.