Company Filing History:
Years Active: 2010-2012
Title: Gregory Herdt: Innovator in Thin Film Technology
Introduction
Gregory Herdt is a notable inventor based in Selkirk, NY (US), recognized for his contributions to thin film technology. He holds a total of 3 patents that showcase his innovative approaches in the field of semiconductor devices and ultra-thin film formation.
Latest Patents
One of his latest patents is titled "Ultra-thin film formation using gas cluster ion beam processing." This patent describes a method for preparing a thin film on a substrate, which involves forming an ultra-thin hermetic film with a thickness of less than approximately 5 nm. The process includes generating a gas cluster ion beam (GCIB) in a reduced-pressure environment and selecting specific beam acceleration potential and dose to achieve the desired film thickness.
Another significant patent is the "Method of forming semiconductor devices containing metal cap layers." This invention focuses on improving electrical leakage performance and minimizing electromigration in semiconductor devices. The method includes planarizing a workpiece's top surface, forming metal cap layers on conductive paths, and using a GCIB to create doped metal cap layers and doped dielectric layers.
Career Highlights
Gregory Herdt is currently associated with Tel Epion Corporation, where he applies his expertise in thin film technology. His work has significantly advanced the field, particularly in the development of methods that enhance the performance of semiconductor devices.
Collaborations
He collaborates with notable coworkers, including Noel Russell and Frank M Cerio, Jr., contributing to innovative projects and advancements in technology.
Conclusion
Gregory Herdt's work in thin film technology and semiconductor devices exemplifies his innovative spirit and dedication to advancing the field. His patents reflect significant advancements that have the potential to impact various applications in technology.