Company Filing History:
Years Active: 1993-1996
Title: Innovations of Gregory Brancaleoni
Introduction
Gregory Brancaleoni is an accomplished inventor based in Newark, DE (US). He has made significant contributions to the field of polishing compositions, particularly in the context of integrated circuits. With a total of five patents to his name, Brancaleoni's work has advanced the technology used in surface polishing.
Latest Patents
Brancaleoni's latest patents include innovative processes for preparing activated polishing compositions. One notable patent discloses a method for creating compositions suitable for polishing surfaces, especially integrated circuits. This process involves activating a base abrasive by adding a second cation, which enhances the polishing rate. The activation occurs through chemical adsorption of the activating cation onto the base abrasive during cyclic impact in an aqueous medium with a favorable pH for adsorption. Another patent focuses on improved compositions for polishing silicon, silica, or silicon-containing articles. This composition consists of an aqueous medium, abrasive particles, and an anion that controls the rate of silica removal. The anion is derived from compounds with at least two acid groups, ensuring effective polishing or planarizing of workpiece surfaces.
Career Highlights
Brancaleoni has built a successful career at Rodel Inc., where he has been instrumental in developing advanced polishing technologies. His expertise in the field has led to numerous innovations that have enhanced the efficiency and effectiveness of polishing processes.
Collaborations
Brancaleoni has collaborated with notable colleagues, including Lee Melbourne Cook and Scott B Loncki. These partnerships have contributed to the development of cutting-edge polishing solutions.
Conclusion
Gregory Brancaleoni's contributions to the field of polishing compositions have significantly impacted the technology used in integrated circuits. His innovative patents and collaborative efforts continue to drive advancements in this essential area of research and development.
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