Kyiv, Ukraine

Gregory A Serhiyenko


Average Co-Inventor Count = 7.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2008-2012

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2 patents (USPTO):Explore Patents

Title: Gregory A Serhiyenko: Innovator in Vapor Deposition Technology

Introduction

Gregory A Serhiyenko is a notable inventor based in Kyiv, Ukraine. He has made significant contributions to the field of material science, particularly in the area of vapor deposition techniques. With a total of 2 patents to his name, Serhiyenko's work has implications for various industrial applications.

Latest Patents

One of his latest patents focuses on the vapor deposition of dissimilar materials. This innovative method involves depositing a first material on a substrate by providing the substrate in a deposition chamber. A molten body is formed between the substrate and a source of the first material by melting one or more second materials. A flow of the first material is then passed through the molten body and from the molten body to the substrate as a vapor flow. An essentially non-expending portion of the molten body comprises an alloy that has a melting temperature below that of the first material. This technique enhances the efficiency and effectiveness of material deposition processes.

Career Highlights

Gregory A Serhiyenko is currently employed at United Technologies Corporation, where he continues to develop and refine his innovative techniques. His work at this esteemed company allows him to collaborate with other experts in the field and contribute to cutting-edge research and development.

Collaborations

Throughout his career, Serhiyenko has worked alongside talented individuals such as Igor V Belousov and Igor S Malashenko. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Gregory A Serhiyenko is a prominent figure in the realm of vapor deposition technology, with a focus on innovative methods that enhance material application processes. His contributions to the field are significant and continue to influence advancements in material science.

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