Neuchâtel, Switzerland

Gregor M Schürmann


Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 71(Granted Patents)


Location History:

  • Neuchâtel, CH (2008 - 2009)
  • Somerville, MA (US) (2009)

Company Filing History:


Years Active: 2008-2009

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3 patents (USPTO):Explore Patents

Title: Innovations of Gregor M Schürmann

Introduction

Gregor M Schürmann is an accomplished inventor based in Neuchâtel, Switzerland. He has made significant contributions to the field of electrically conducting structures, with a focus on methods that enhance the control and fabrication of these structures. With a total of 3 patents to his name, Schürmann's work is at the forefront of innovation in material science.

Latest Patents

Schürmann's latest patents include a method for controlling gaps in electrically conducting structures. This method involves exposing a solid-state structure to specific fabrication process environment conditions that alter the extent of the gap. During this exposure, a voltage bias is applied across the gap, and the electron tunneling current is measured to control the process environment effectively.

Another notable patent focuses on controlling the gap between electrically conducting electrodes on a support structure. This method utilizes a flux of ions to transport material to the electrode tips, thereby enhancing the material at the tips within the gap.

Additionally, Schürmann has developed a lift-off patterning processing technique that employs energetically-stimulated local removal of solid-condensed-gas layers. This innovative method allows for the formation of a patterned material layer on a structure by condensing vapor into a solid layer and selectively removing regions using a directed energy beam.

Career Highlights

Gregor M Schürmann is currently associated with Harvard College, where he continues to advance his research and innovations. His work has garnered attention for its practical applications in various technological fields.

Collaborations

Schürmann has collaborated with notable colleagues, including Jene A Golovchenko and Gavin M King. These collaborations have further enriched his research and contributed to the development of groundbreaking technologies.

Conclusion

Gregor M Schürmann's contributions to the field of electrically conducting structures exemplify the spirit of innovation. His patents reflect a deep understanding of material science and a commitment to advancing technology.

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