Syracuse, NY, United States of America

Greg Kliss

This inventor holds 1 USPTO granted patent. Top assignee: Src Corporation. Active years: 2009.


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: The Innovations of Greg Kliss

Introduction

Greg Kliss is an accomplished inventor based in Syracuse, NY (US). He has made significant contributions to the field of radio frequency (RF) technology. His innovative work has led to the development of a unique RF attenuation circuit that enhances the performance of RF receiving systems.

Latest Patents

Greg Kliss holds 1 patent for his invention of an RF attenuation circuit. This circuit selectively attenuates a received RF signal before it reaches sensitive modifying devices, such as a low noise amplifier or an analog to digital converter. The design includes a delay element upstream of its attenuator, allowing it to effectively manage high energy pulses of short duration, specifically those lasting less than 10 nanoseconds. This feature is crucial for overcoming delays associated with couplers, detectors, thresholds, and switches in the attenuation-related circuitry.

Career Highlights

Greg Kliss is currently employed at Src Corporation, where he continues to innovate and develop advanced RF technologies. His work at Src Corporation has positioned him as a key player in the field, contributing to various projects that enhance RF signal processing.

Collaborations

Throughout his career, Greg has collaborated with notable colleagues, including John G Wiley and John Charles Dougherty. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Greg Kliss exemplifies the spirit of innovation in the RF technology sector. His contributions, particularly the RF attenuation circuit, demonstrate his commitment to enhancing the capabilities of RF systems. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
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