Concord, NH, United States of America

Grant A Dillon

This inventor holds 1 USPTO granted patent. Top assignee: Astronics Aerosat Corporation. Active years: 2018.


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Grant A Dillon - Innovator in Radome Technology

Introduction

Grant A Dillon is an accomplished inventor based in Concord, NH (US). He has made significant contributions to the field of radome technology, particularly through his innovative patent that enhances the strength and functionality of radome assemblies.

Latest Patents

One of Grant A Dillon's notable patents is a containment system and increased strength radome assembly. This invention provides a containment system designed to protect all or part of a radome and an external subassembly. The patent describes an embodiment that includes a fabric material and an attachment system for securing the fabric to both the radome and the radome attachment ring. This innovative approach aims to improve the durability and effectiveness of radome structures.

Career Highlights

Grant A Dillon is currently employed at Astronics Aerosat Corporation, where he continues to develop cutting-edge technologies in the aerospace sector. His work focuses on enhancing the performance and reliability of radome systems, which are critical for various applications in aviation and telecommunications.

Collaborations

Throughout his career, Grant has collaborated with talented professionals, including Frank J Blanda and Bruce D Kelly. These partnerships have contributed to the advancement of technology in their field and have fostered a collaborative environment for innovation.

Conclusion

Grant A Dillon is a notable inventor whose work in radome technology has led to significant advancements in the industry. His patent for a containment system and increased strength radome assembly exemplifies his commitment to innovation and excellence.

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