Graham L W Cross

Title: Innovations of Graham L W Cross

Introduction

Graham L W Cross is an accomplished inventor based in Sidney, CA. He has made significant contributions to the field of surface patterning technology. His innovative approach has led to the development of a unique process that enhances the fabrication of patterns on carbon-based surfaces.

Latest Patents

Graham holds a patent for a "Process and system for fabrication of patterns on a surface." This invention provides a system and process for patterning structures on a carbon-based surface by exposing part of the surface to an ion flux. The exposure modifies the material properties of the surface, creating a hard mask effect. A subsequent etching of the unexposed parts forms the desired structures. The invention allows for precise control over the ion exposure, enabling the alteration of the surface structure to create a mask pattern without significantly removing material. This method is particularly effective for producing well-defined structures down to nano-scale dimensions.

Career Highlights

Graham's career is marked by his dedication to advancing technology in surface patterning. His work has implications for various applications, including semiconductor manufacturing and nanotechnology. He is associated with the Provost Fellows and Scholars of the College of the Holy and Undivided Trinity of Queen Elizabeth, Near Dublin, where he continues to innovate and contribute to research.

Collaborations

Graham has collaborated with notable colleagues, including Warren McKenzie and John B Pethica. Their combined expertise has furthered the development of advanced technologies in their field.

Conclusion

Graham L W Cross is a pioneering inventor whose work in surface patterning technology has opened new avenues for innovation. His patent demonstrates a significant advancement in the fabrication of nano-scale structures, showcasing his impact on the field.