Denver, CO, United States of America

Grace Derrer

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Boa Technology Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Grace Derrer. Retrieved from https://idiyas.com/inventor/grace-derrer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Grace Derrer: Innovator in Lace Tightening Technology

Introduction

Grace Derrer is a talented inventor based in Denver, Colorado. She has made significant contributions to the field of lace tightening technology. With a focus on innovation, Grace has developed a unique solution that enhances the functionality of lace systems.

Latest Patents

Grace holds a patent for a guide member for a lace tightening device. This invention showcases her ability to create practical solutions that improve user experience. Her patent reflects her commitment to advancing technology in this niche area.

Career Highlights

Grace is currently employed at Boa Technology Inc., a company known for its innovative products in the footwear and sporting goods industries. Her work at Boa Technology has allowed her to apply her inventive skills in a collaborative environment.

Collaborations

Throughout her career, Grace has worked alongside talented individuals such as Marco Armiraglio and Alessandro Manzato. These collaborations have enriched her professional journey and contributed to her success as an inventor.

Conclusion

Grace Derrer is a remarkable inventor whose work in lace tightening technology exemplifies innovation and creativity. Her contributions to Boa Technology Inc. and her patent demonstrate her dedication to improving everyday products.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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