Osaka, Japan

Goro Hamano

This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Goro Hamano. Retrieved from https://idiyas.com/inventor/goro-hamano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: Goro Hamano and His Pattern Generation Display System

Introduction

Goro Hamano is an inventor associated with Osaka, Japan, and Matsushita Electric Industrial Co., Ltd. His recorded patent concerns a display system designed to position generated patterns, including characters, with fine control.

Latest Patents

Hamano’s listed patent is “Pattern Generation Display System.” It describes a system with pattern-code processing, refresh memory, a pattern generator, and pattern-data processing. The system defines a pattern’s position using a base-position datum and a displacement datum. It stores the pattern code and displacement information in memory and uses the data to display the pattern at its adjusted position. This approach makes it easier to shift generated patterns by small increments and align characters according to the features of a character or sentence. Hamano is credited with 1 patent.

Career Highlights

Hamano’s patent reflects work on raster-scan display technology and precise pattern placement. The invention’s use of base positions and displacement data provides a method for making small adjustments to displayed characters and other patterns.

Collaborations

Hamano’s listed company affiliation is Matsushita Electric Industrial Co., Ltd. His named coworker is Itaru Kawasaki.

Conclusion

Goro Hamano’s recorded invention addresses fine-positioning needs in pattern-generation displays, helping make character placement more adjustable and precise.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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