Gorden Seth Starkey

Title: Gorden Seth Starkey: Innovator in Etching Technology

Introduction

Gorden Seth Starkey is a notable inventor based in Chittenden County, Vermont. He has made significant contributions to the field of etching technology, particularly in methods that enhance the precision of contact hole etching without damaging the substrate.

Latest Patents

Starkey holds a patent for a method titled "Method for etching vertical contact holes without substrate damage." This innovative technique allows for the etching of vias without directional etching damage to the substrate. The process involves forming a pattern image on an insulating layer of known thickness over a substrate. A conformal layer is then created on the pattern image, followed by the production of a vertical contact hole through the conformal layer and into the insulating layer via directional etching. This method ensures that the depth of the vertical contact hole is equal to the thickness of the insulating layer minus the width of the conformal spacer. The insulating layer is subsequently removed using an isotropic wet etch, achieving a near-vertical edge contact hole without causing directional etching damage to the substrate.

Career Highlights

Gorden Starkey is associated with the International Business Machines Corporation (IBM), where he has applied his expertise in etching technology. His work has contributed to advancements in semiconductor manufacturing processes, enhancing the efficiency and reliability of electronic components.

Collaborations

Starkey has collaborated with notable colleagues, including John Edward Cronin and Michael David Potter. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Gorden Seth Starkey's contributions to etching technology exemplify the impact of innovative methods in the semiconductor industry. His patent reflects a commitment to advancing technology while ensuring substrate integrity.