Gopal Ravichandran

Title: Gopal Ravichandran: Innovator in Vanadium Processing and FCC Catalyst Additives

Introduction

Gopal Ravichandran is a prominent inventor based in Tamil Nadu, India. He has made significant contributions to the field of chemical engineering, particularly in the processing of vanadium and the development of FCC catalyst additives. With a total of 11 patents to his name, Ravichandran's work has had a notable impact on industrial processes.

Latest Patents

Among his latest patents is a process for obtaining vanadium oxide from gasifier slag. This innovative method involves pulverizing the slag to create a slurry, which is then dried and roasted in the presence of air. The process effectively leaches the slag to extract vanadium components, ultimately producing vanadium pentoxide. Another significant patent focuses on an FCC catalyst additive designed for the cracking of petroleum feedstock. This additive, which includes zeolite, clay, and Group IVB metal compounds, enhances the yields of propylene and LPG while maintaining hydrothermal stability.

Career Highlights

Gopal Ravichandran has worked with leading companies such as Reliance Industries Limited and Indian Oil Corporation Limited. His experience in these organizations has allowed him to apply his innovative ideas in practical settings, contributing to advancements in chemical processing technologies.

Collaborations

Ravichandran has collaborated with notable professionals in his field, including Sukumar Mandal and Asit Kumar Das. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise.

Conclusion

Gopal Ravichandran's contributions to the fields of vanadium processing and FCC catalyst additives highlight his role as a key innovator in chemical engineering. His patents and collaborations reflect a commitment to advancing industrial processes and improving efficiency.