Goong Soo Nam

Title: Goong Soo Nam and Plasma Dry-Etching Innovation.

Introduction

Goong Soo Nam is an inventor based in Suwon, South Korea, associated with Sungkyunkwan University. His patent work concerns plasma dry etching, a process used to selectively remove material during the fabrication of semiconductor and other microelectronic devices.

Latest Patents

Nam is credited with 1 patent: “Method for Dry Etching Using Plasma.” The disclosed method places a substrate bearing a photoresist pattern inside a plasma dry-etching chamber. It first modifies the pattern’s surface through plasma deposition using a first gas, then selectively etches the non-exposed portion of that surface-modified pattern using a second gas. This staged approach describes a way to control photoresist etching through successive plasma processes.

Career Highlights

Nam’s listed patent reflects work on process innovation in plasma-based manufacturing. The method focuses on modifying a photoresist surface before selectively etching it, an approach relevant to precision patterning.

Collaborations

Nam’s listed coworkers include Geun Young Yeom and Hee Ju Kim. His association with Sungkyunkwan University connects this invention to academic research and development.

Conclusion

Goong Soo Nam’s patent describes a two-stage plasma dry-etching method that combines surface modification with selective etching, highlighting his contribution to process innovation.