Goeran Klose

Title: Goeran Klose: Innovator in Polycrystalline Silicon Production

Introduction

Goeran Klose, an esteemed inventor based in Hirten, Germany, has made significant contributions to the field of materials science, particularly in the production of polycrystalline silicon. With a total of three patents to his name, Klose is recognized for his innovations that enhance the efficiency and effectiveness of silicon production processes.

Latest Patents

Among Klose's latest patents is a process for producing polycrystalline silicon. This innovative method involves reducing deposition on a sightglass in a reactor for chemical vapor deposition (CVD) of silicon. Specifically, it outlines a technique wherein a first purge gas stream is conducted substantially parallel to the reactor end surface of the sightglass, while a second purge gas stream is directed within the sightglass tube at an angle towards the interior of the reactor. This dual gas stream approach significantly improves silicon deposition efficiency.

Career Highlights

Goeran Klose has been a vital part of Wacker Chemie AG, a leading company in the chemical industry. His work at Wacker Chemie has allowed him to collaborate on advanced projects that push the boundaries of silicon manufacturing technology. Klose's patents reflect his commitment to driving innovation within his field.

Collaborations

Throughout his career, Klose has collaborated with notable coworkers, including Heinz Kraus and Franz Salzeder. These partnerships have fostered a creative environment that encourages the development of pioneering solutions in silicon production processes.

Conclusion

Goeran Klose's contributions to the production of polycrystalline silicon highlight his role as an inventor who is shaping the future of materials technology. With his innovative approaches and collaborative spirit, Klose continues to impact the industry positively, ensuring more efficient and sustainable silicon production methods.