Carpinteria, CA, United States of America

Goeffrey W Marks

This inventor holds 1 USPTO granted patent. Top assignee: Astro Aerospace Corporation. Active years: 1996.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1996

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Goeffrey W Marks: Innovator in Spacecraft Mechanisms

Introduction

Goeffrey W Marks is a notable inventor based in Carpinteria, California. He has made significant contributions to the field of aerospace engineering, particularly in the development of mechanisms for spacecraft.

Latest Patents

Marks holds a patent for a "Tie-down and release mechanism for spacecraft." This innovative release mechanism is designed to attach and release appendages from a main body while minimizing shock and frictional effects. The mechanism consists of a housing, a main cylindrical body, a collet, a toroidal spring, and actuators. The main cylindrical body features radial projections, and a wrap spring couples the collet and the toroidal spring. This invention showcases Marks' expertise in creating efficient and reliable systems for aerospace applications.

Career Highlights

Goeffrey W Marks is currently employed at Astro Aerospace Corporation, where he continues to work on advanced aerospace technologies. His experience and knowledge in the field have made him a valuable asset to the company.

Collaborations

Marks collaborates with Grant L Young, a fellow innovator in the aerospace sector. Together, they contribute to the development of cutting-edge technologies that enhance spacecraft functionality.

Conclusion

Goeffrey W Marks is a distinguished inventor whose work in spacecraft mechanisms has the potential to advance aerospace engineering. His innovative designs and collaborative efforts continue to shape the future of space exploration.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…