San Jose, CA, United States of America

Glenn V Sincerbox


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Glenn V Sincerbox: Innovator in Lithographic Technology

Introduction

Glenn V Sincerbox is a notable inventor based in San Jose, California. He has made significant contributions to the field of lithography, particularly through his innovative patent. His work focuses on enhancing the precision of lithographic tools, which are essential in various manufacturing processes.

Latest Patents

Glenn holds a patent for an "Optical system for focus correction for a lithographic tool." This invention provides an apparatus and process for determining focus correction for lithographic tools. The system utilizes a periodic surface relief structure that contains focus information, which is illuminated to generate diffraction beams. By translating an object orthogonally to the periodic structure, changes in the intensity of the diffracted beams can be observed. Focus correction is then determined based on these intensity changes. This patent showcases Glenn's expertise in optical systems and their application in improving lithographic technology. He has 1 patent to his name.

Career Highlights

Glenn is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to work on cutting-edge technologies and collaborate with other talented professionals in the field. His contributions have been instrumental in advancing the capabilities of lithographic tools.

Collaborations

Throughout his career, Glenn has collaborated with several notable colleagues, including Anthony Juliana and Milton Russell Latta. These collaborations have fostered an environment of innovation and have led to the development of advanced technologies in lithography.

Conclusion

Glenn V Sincerbox is a distinguished inventor whose work in lithographic technology has made a significant impact. His innovative patent and collaboration with industry professionals highlight his commitment to advancing the field. His contributions continue to shape the future of lithography and optical systems.

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