The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 1987
Filed:
Apr. 26, 1985
Applicant:
Inventors:
Anthony Juliana, Jr, San Jose, CA (US);
Milton R Latta, San Jose, CA (US);
Glenn V Sincerbox, San Jose, CA (US);
Carlton G Willson, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356150 ; 356152 ;
Abstract
An apparatus and process for determining focus correction for a lithographic tool are provided. A periodic surface relief structure containing focus information is illuminated so that diffraction beams are generated. An object is translated orthogonally to the periodic structure to cause a change in the intensity of the diffracted beams. Focus correction is determined based upon the changes in the intensity of the diffracted beams.