Glenn M Stefanski

Title: Glenn M. Stefanski: Inventor of Wafer and Photomask Safeguarding Technology.

Introduction

Glenn M. Stefanski is an inventor based in Hopewell Junction, New York. His patent work includes technology designed to safeguard wafers and photomasks, valuable articles used in semiconductor manufacturing. He is associated with International Business Machines Corporation and holds 2 patents.

Latest Patents

Stefanski’s listed latest patent is “System and Method for Safeguarding Wafers and Photomasks.” The invention describes a container for storing a wafer or photomask, fitted with an anti-theft unit. A flashing unit emits a predetermined light pattern, and a trigger unit detects that pattern and activates the anti-theft function. The corresponding method involves storing the article in the protected container, providing and detecting the specified light pattern, and triggering the anti-theft function in response.

Career Highlights

Stefanski’s patent activity reflects work on protecting sensitive semiconductor-related articles. The described system links a recognizable light signal to a container-mounted security function, offering a method for controlling when that function is activated.

Collaborations

His listed coworkers include Paul D. Hand and Andrew Paul Wyskida. His association with International Business Machines Corporation places his invention within the company’s broader technology and research environment.

Conclusion

Glenn M. Stefanski’s patent work includes a light-triggered security system for safeguarding wafers and photomasks, highlighting a practical approach to protecting valuable semiconductor materials.