This inventor holds 1 USPTO granted patent. Top assignee: Agere Systems Guardian Corp.. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Glenn Alan Marshall: Innovator in Semiconductor Cleaning Technology
Introduction
Glenn Alan Marshall is a notable inventor based in Northampton, PA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer cleaning processes. His innovative approach has led to advancements that enhance the reliability of integrated circuit devices.
Latest Patents
Marshall holds a patent for a method and apparatus known as the Dark Spin Rinse/Dry. This invention addresses the critical issue of light exposure during the rinsing and drying of semiconductor wafers in cleaning machines. By implementing an opaque window assembly or light-blocking material, his invention effectively prevents ambient light from entering the processing chamber. This innovation reduces scrap and improves the reliability of integrated circuit devices by eliminating light-induced galvanic corrosion during the cleaning process.
Career Highlights
Glenn Alan Marshall is associated with Agere Systems Guardian Corporation, where he has applied his expertise in semiconductor technology. His work has been instrumental in making the fabrication of advanced integrated circuit devices feasible, especially as dimensions continue to shrink. The cost-effective application of light-blocking materials in existing wafer cleaning machines showcases his commitment to practical and impactful solutions in the industry.
Collaborations
Throughout his career, Marshall has collaborated with talented individuals such as Kevin Paul Yanders and Charles Walter Pearce. These partnerships have contributed to the development and refinement of innovative technologies in the semiconductor field.
Conclusion
Glenn Alan Marshall's contributions to semiconductor cleaning technology exemplify the importance of innovation in enhancing device reliability. His patent for the Dark Spin Rinse/Dry method represents a significant advancement in the industry, ensuring that the future of integrated circuit devices remains bright and reliable.