Austin, TX, United States of America

Glen Jenkins


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: The Innovations of Glen Jenkins in Semiconductor Polishing Technology

Introduction

Glen Jenkins, an accomplished inventor based in Austin, TX, has made significant contributions to the field of semiconductor manufacturing. With a focus on enhancing the precision of Chemical Mechanical Polishing (CMP) procedures, Jenkins has developed innovative methods that improve the quality and efficiency of polishing slurries used on semiconductor wafers.

Latest Patents

Jenkins holds a patent for the "Preparation of High-Performance Silica Slurry Using a Centrifuge." This groundbreaking method offers a system for effectively separating impurities—such as large abrasive particles and foreign matter—from abrasive polishing slurries. Prior to CMP procedures, impurities larger than about 25 microns are eliminated through an initial filtration process. The filtrate is further processed using a solid bowl, sedimentation-type centrifuge, which effectively removes particles greater than 0.5 microns. This innovative approach ensures that the resulting polishing slurry minimizes damage to semiconductor wafer surfaces.

Career Highlights

Glen Jenkins is proud to be a part of Advanced Technology Materials, Inc., where he applies his expertise to advance the development of high-tech materials. Through his work, Jenkins has contributed to the improvement of semiconductor polishing technologies, enhancing the overall performance and reliability of electronic components.

Collaborations

Throughout his career, Jenkins has collaborated with esteemed colleagues, including William H. Mullee and Michael Jones. Their combined expertise in the field has led to fruitful discussions and innovations that propel their collective work forward in the semiconductor technology landscape.

Conclusion

Glen Jenkins represents the epitome of ingenuity in the semiconductor industry, with his innovations paving the way for improved manufacturing processes. His patented method for preparing high-performance polishing slurry highlights the importance of continuous improvement in technology, ensuring better outcomes for semiconductor production and advancing the field as a whole.

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