Kennewick, WA, United States of America

Glen C Dunham

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 118(Granted Patents)


Company Filing History:


Years Active: 1994-2011

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4 patents (USPTO):Explore Patents

Title: Innovations of Glen C Dunham

Introduction

Glen C Dunham is a notable inventor based in Kennewick, Washington. He holds a total of four patents, showcasing his contributions to the field of materials science and engineering. His work primarily focuses on the development of advanced ceramic and hybrid ceramic films, which have significant applications in semiconductor technology.

Latest Patents

One of Dunham's latest patents is a method for producing high purity low dielectric constant ceramic and hybrid ceramic films. This invention highlights the usefulness of humidity treatments in enhancing the mechanical integrity of porous dielectric films while maintaining their porosity and dielectric constant. The invention also introduces a specific family of additives that improve the control of film porosity and quality, making it particularly effective for low-dielectric constant applications. Another significant patent involves a method of forming complex three-dimensional microstructures using photosensitive materials. This innovative approach allows for the creation of intricate structures by applying external stimuli to generate voids and utilizing sacrificial materials to preserve patterns during the layering process.

Career Highlights

Dunham has worked with prominent organizations such as Battelle Memorial Institute and the Pacific Northwest Division. His experience in these institutions has contributed to his expertise in developing advanced materials and technologies.

Collaborations

Throughout his career, Dunham has collaborated with notable colleagues, including Jerome C Birnbaum and Glen E Fryxell. These partnerships have likely enriched his research and innovation efforts.

Conclusion

Glen C Dunham's contributions to the field of materials science through his patents and collaborations demonstrate his significant impact on technology and innovation. His work continues to influence advancements in semiconductor applications and complex microstructure fabrication.

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