Battelle Memorial Institute

Advanced Imaging Systems, Inc.

Pacific Northwest Division

Glen C Dunham

Glen E Fryxell

Suresh Baskaran

Jerome C Birnbaum

George F Garlick

Gary D Maupin

Ralph E Williford

Lawrence E Bowman

Christopher Andrew Coyle

Shari Li Xiaohong

Porous ceramic and hybrid ceramic films are useful as low dielectric constant interlayers in semiconductor interconnects. (Hybrid ceramic films are defined as films that contain organic and ceramic molecular components in the structure, as, for example, organosilicates). This invention describes the usefulness of humidity treatments (using specific temperature/humidity treatments as illustrative examples) in increasing mechanical integrity of porous dielectric films with minimal detrimental effect on film porosity or dielectric constant and with no adverse impact on film quality. The efficacy of such treatments is illustrated using surfactant-templated mesoporous silicate films as an example. This invention also describes a specific family of additives to be used with highly pure alkali-metal-free ceramic and hybrid precursors for such dielectric films that will enable better control of the film porosity and quality and lower dielectric constants with the required mechanical integrity. The efficacy of such additives is illustrated using surfactant-templated mesoporous silicate films as a model example. The invention should be broadly applicable to any cross-linked ceramic or hybrid ceramic films (including silicate and organosilicate films, and especially highly porous forms of the films for low-dielectric constant applications). The invention has been found to be particularly effective with surfactant-templated silicate films with nanometer-scale porosity. The invention in either embodiment should also be applicable to evaporation-induced formation of other cross-linked shapes such as fibers and powders.

Method for producing high purity low dielectric constant ceramic and hybrid ceramic films

A method of forming complex three-dimensional microstructures wherein an external stimulus is applied to a first layer of a photosensitive material, thereby creating voids in the first layer, and any material present in those voids is removed. A sacrificial material is then provided within at least a portion of the voids. This sacrificial layer fills the voids, either in whole or in part, and enables a second layer of photosensitive material to be stacked upon the first, while still preserving the pattern formed in the first layer. Once the sacrificial layer has been applied, a second layer of photosensitive material may then be stacked onto the first. Successive layers of photosensitive material and sacrificial material may be added until a final, complex three-dimensional structure is created. The sacrificial material may then be removed with a solvent such as carbon dioxide.

Three dimensional microstructures and method of making

Vacuum/gas phase reactor embodiments used in gas phase dehydroxylation and alkylation reactions are described in which the substrate could be subjected to high vacuum, heated to target temperature, and treated with silane as quickly and efficiently as possible. To better facilitate the silylation and to increase the efficiency of the process, the reactor is designed to contain quasi-catalytic surfaces which can act both as an &ldquo;activator&rdquo; to put species in a higher energy state or a highly activated state, and as a &ldquo;scrubber&rdquo; to eliminate possible poisons or reactive by-products generated in the silylation reactions. One described embodiment is a hot filament reactor having hot, preferably metallic, solid surfaces within the reactor's chamber in which wafers having mesoporous silicate films are treated. Another is an IR reactor having upper and lower quartz windows sealing the upper and lower periphery of an aluminum annulus to form a heated chamber. Finally, a flange reactor is described that includes a flange base and lid forming a tiny chamber therein for a wafer, the reactor being heated by conduction from a hot sand bath. The dehydroxylation and alkylation treatment of mesoporous silica films produces treated films exhibiting low dielectric constant and high elastic modulus.

Vacuum/gas phase reactor for dehydroxylation and alkylation of porous silica

A preferred embodiment of this invention is illustrated in FIG. 4 showing an offset and tilted object transducer 50 being rotated about a system axis 51 to sequentially insonify the object from various acute incident angles .theta. to the system axis to provide images of the out-of-focus structures at spaced locations at the hologram detection surface 18 at different spaced times. If the pulse rate of the object transducer is greater than the fusion of the eye, the eye is able to average two or more images into a single perceived image. Likewise, video equipment that receives images at a rate greater than 30 Hertz will average two or more images and display the image at a rate of approximately 30 Hertz. Additionally, external video processing may be utilized to electronically average two or more images electronically to obtain an averaged image at any time constant desired by the operator. Such a system effectively neutralizes or blends the out-of-focus structure of an object spaced from a selected focus plane 27 while maintaining the structure within the plane in sharp consistent contrast to provide consistent, quality images of the internal structure of an object 12.

Ultrasonic holography imaging method and apparatus

Growing community of inventors

Kennewick, WA, United States of America

Glen C Dunham