Reaumont, France

Gilles Fanget


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Gilles Fanget

Introduction

Gilles Fanget is a notable inventor based in Reaumont, France. He has made significant contributions to the field of technology, particularly in the area of pattern formation on thin films. His innovative approach has led to the development of a unique method that enhances the precision of pattern alignment.

Latest Patents

Gilles Fanget holds a patent for a method titled "Method for forming patterns aligned on either side of a thin film." This method involves depositing a first pattern layer on a thin film that is placed on a substrate. The process includes local etching of the thin film to create a first marking, followed by etching the first pattern layer to establish a first pattern. Additionally, a first bonding layer is deposited to cover the first marking and pattern. The method also allows for the suppression of the substrate and the etching of the first bonding layer to create a second marking. Finally, a second pattern layer is deposited and etched to form a second pattern. This innovative technique has the potential to advance various applications in technology.

Career Highlights

Gilles Fanget is associated with the Commissariat à l'Énergie Atomique, a prominent research institution in France. His work there has focused on developing advanced methods for pattern formation, which are crucial for various technological applications. His expertise and innovative mindset have positioned him as a valuable contributor to the field.

Collaborations

Gilles Fanget has collaborated with several talented individuals, including Maud Vinet and Simon Deleonibus. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Gilles Fanget's contributions to the field of technology through his innovative patent and collaborative efforts highlight his importance as an inventor. His work continues to influence advancements in pattern formation techniques, showcasing the impact of his creativity and expertise.

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