The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2008
Filed:
Dec. 16, 2003
Maud Vinet, Grenoble, FR;
Simon Deleonibus, Claix, FR;
Bernard Previtali, Grenoble, FR;
Gilles Fanget, Reaumont, FR;
Maud Vinet, Grenoble, FR;
Simon Deleonibus, Claix, FR;
Bernard Previtali, Grenoble, FR;
Gilles Fanget, Reaumont, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
A method for forming patterns which are aligned on either side of a thin film deposited on a substrate. The method includes depositing a first pattern layer on the thin film which may occur before or after the local etching of the thin film to form a first marking. The method includes etching the first pattern layer in order to form a first pattern and depositing a first bonding layer for covering the first marking and the first pattern. The method may include suppressing the substrate as well as etching the first bonding layer to form a second marking at the location of the first marking. The method includes depositing a second pattern layer, and etching the second pattern layer to form the second pattern.