Company Filing History:
Years Active: 2003
Title: Innovations of Gilbert Fan in Microelectronic Fabrication
Introduction
Gilbert Fan is a notable inventor based in Jubei, Taiwan. He has made significant contributions to the field of microelectronics, particularly through his innovative patent related to patterned conductor layers.
Latest Patents
Gilbert Fan holds a patent titled "Patterned conductor layer passivation method with dimensionally stabilized planarization." This invention involves a method for forming a microelectronic fabrication that begins with providing a substrate. A patterned conductor layer is then formed over the substrate, which exhibits topographic variation at its periphery. Following this, a planarizing passivation layer made of a thermally reflowable material is applied to passivate the topographic variation. A dimensionally stabilizing layer is subsequently formed upon the planarizing passivation layer. Finally, the microelectronic fabrication undergoes thermal annealing to create a thermally annealed planarizing passivation layer. This innovative approach helps to attenuate the replication of topographic variations at the periphery of the patterned conductor layer.
Career Highlights
Gilbert Fan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing microelectronic fabrication techniques, contributing to advancements in technology.
Collaborations
Throughout his career, Gilbert has collaborated with esteemed colleagues such as Fu-Jier Fahn and Kuo-Wei Lin. These collaborations have further enriched his work and contributed to the development of innovative solutions in microelectronics.
Conclusion
Gilbert Fan's contributions to microelectronic fabrication through his patent demonstrate his expertise and innovative spirit. His work continues to influence the field and pave the way for future advancements in technology.