Company Filing History:
Years Active: 2001-2006
Title: The Innovations of Gilbert Declerck
Introduction
Gilbert Declerck is a notable inventor based in Winksele, Belgium. He has made significant contributions to the field of polymer technology, particularly in the area of micropatterning. With a total of 2 patents to his name, Declerck's work has implications for various applications in the semiconductor industry.
Latest Patents
One of his latest patents is titled "Fluorinated hard mask for micropatterning of polymers." This invention discloses the formation of a hard mask layer in an organic polymer layer by modifying at least locally the chemical composition of a part of the exposed organic low-k polymer. This modification starts from an exposed surface of the polymer and extends into the polymer, thereby increasing the chemical resistance of the modified part. As a result, this modified part can be used as a hard mask or an etch stop layer for plasma etching.
Career Highlights
Gilbert Declerck is currently associated with Imec Vzw, a leading research and innovation hub in nanoelectronics and digital technologies. His work at Imec has allowed him to explore advanced materials and processes that are crucial for the development of next-generation electronic devices.
Collaborations
Throughout his career, Declerck has collaborated with several esteemed colleagues, including Mikhail Rodionovich Baklanov and Serge Vanhaelemeersch. These collaborations have further enriched his research and contributed to the advancement of technology in his field.
Conclusion
Gilbert Declerck's innovative work in polymer technology and his contributions to the field through his patents highlight his role as a significant inventor. His ongoing research continues to pave the way for advancements in the semiconductor industry.