Les Geneveys-sur-Coffrane, Switzerland

Gian Carlo Poli

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Asulab S.a., The Swatch Group Research and Development Ltd. Active years: 2009-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gian Carlo Poli. Retrieved from https://idiyas.com/inventor/gian-carlo-poli-aq36d8dm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2009-2026

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2 patents (USPTO):Explore Patents

Title: Gian Carlo Poli: Innovator in Transparent Technology

Introduction

Gian Carlo Poli is a notable inventor based in Les Geneveys-sur-Coffrane, Switzerland. He has made significant contributions to the field of transparent technology, particularly through his innovative methods of manufacturing transparent elements.

Latest Patents

Gian Carlo Poli holds a patent for a "Method of manufacturing a transparent element including transparent electrodes." This method encompasses various steps aimed at enhancing the production of transparent elements, which are crucial in numerous applications.

Career Highlights

Gian Carlo Poli is associated with Asulab S.A., where he applies his expertise in developing advanced technologies. His work has positioned him as a key figure in the industry, contributing to the evolution of transparent materials.

Collaborations

He collaborates with Joachim Grupp, further enhancing the innovative capabilities within his field. Their partnership exemplifies the importance of teamwork in driving technological advancements.

Conclusion

Gian Carlo Poli's contributions to transparent technology through his patent and collaboration with industry professionals highlight his role as an influential inventor. His work continues to pave the way for future innovations in this vital area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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