Modena, Italy

Giampiero Ottaviani


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2001-2009

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2 patents (USPTO):Explore Patents

Title: Giampiero Ottaviani: Innovator in Semiconductor Manufacturing

Introduction

Giampiero Ottaviani is a notable inventor based in Modena, Italy. He has made significant contributions to the semiconductor industry, holding 2 patents that showcase his innovative approaches to manufacturing processes.

Latest Patents

One of his latest patents is a process for manufacturing wafers usable in the semiconductor industry. This process involves subjecting a first wafer of semiconductor material to implantation to form a defect layer at a distance from a first face. The first wafer is then bonded to a second wafer, with an insulating layer present on the second wafer in contact with the first face of the first wafer. Hydrogen atoms are introduced into the first wafer through a second face at an energy level that avoids generating defects and at a temperature lower than 600° C. This method allows the first wafer to split into a usable layer bonded to the second wafer, while a remaining layer is disposed between the defect layer and the second face of the first wafer. Prior to bonding, the first wafer undergoes processing steps to obtain integrated components.

Another significant patent by Ottaviani is a process for cutting trenches in a single crystal substrate. This process involves cutting a trench in a silicon monocrystal in areas defined by a mask. A mask is formed that defines an etched area on the surface of a monocrystalline silicon wafer, which is eventually covered by a thin layer of oxide. Ions are implanted with sufficient kinetic energy and dose to amorphize the silicon down to a predefined depth within the defined area. The temperature of the wafer is maintained sufficiently low to prevent relaxation of point defects and diffusion of the implanted ions in the crystal lattice. The dislodgment and expulsion of the amorphized portion is initiated by heating the implanted wafer.

Career Highlights

Giampiero Ottaviani is currently employed at STMicroelectronics S.r.l., where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing manufacturing processes that enhance the efficiency and effectiveness of semiconductor production.

Collaborations

Throughout his career, Ottaviani has collaborated with notable colleagues, including Federico Corni and Paolo Ferrari. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Giampiero Ottaviani is a prominent figure in the semiconductor industry, recognized

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