This inventor holds 1 USPTO granted patent. Top assignees: Knj Co., Ltd., Samsung Display Co., Ltd.. Active years: 2019.
Company Filing History:
1 out of 2 
1 out of 27,287 
Years Active: 2019
Title: Gi-Hwan Bae: Innovator in Substrate Polishing Technology
Introduction
Gi-Hwan Bae is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of substrate polishing technology. His innovative approach has led to the development of a unique device and method that enhances the efficiency of substrate polishing.
Latest Patents
Gi-Hwan Bae holds a patent for a substrate polishing device and method. This invention allows for the simultaneous polishing of the upper ground surface, side surface, and lower ground surface of a substrate. The design includes a polishing wheel that can be evenly used across the entire surface, ensuring uniform abrasion. The substrate polishing system features a table for securing the substrate, a spindle positioned at the upper portion of the table, and a cylindrical polishing wheel with a rotating shaft. Additionally, it incorporates a Z-axis movement mechanism for vertical adjustment during the polishing process. He has 1 patent to his name.
Career Highlights
Throughout his career, Gi-Hwan Bae has worked with prominent companies, including Samsung Display Co., Ltd. and Knj Co., Ltd. His experience in these organizations has contributed to his expertise in substrate polishing technology.
Collaborations
Gi-Hwan Bae has collaborated with various professionals in his field, including Jun-Woo Hong. These partnerships have furthered his research and development efforts.
Conclusion
Gi-Hwan Bae is a distinguished inventor whose work in substrate polishing technology has made a significant impact. His innovative patent demonstrates his commitment to advancing the industry.