Ghazal Saheli

Title: Ghazal Saheli: Innovator in Atomic Layer Deposition Technologies

Introduction

Ghazal Saheli is a prominent inventor based in Campbell, CA (US). She has made significant contributions to the field of atomic layer deposition (ALD) technologies. With a total of 2 patents, her work focuses on innovative processing methods and deposition techniques.

Latest Patents

Ghazal's latest patents include an ALD process for NiO film with tunable carbon content. This patent describes processing methods that involve exposing a substrate to a first reactive gas comprising a cyclopentadienyl nickel complex and a second reactive gas with a sub-saturative amount of oxygen. This process results in the formation of a nickel oxide film with a carbon content ranging from about 2 to about 10 atomic percent. Another notable patent is for deposition methods for uniform and conformal hybrid titanium oxide films. This patent discloses methods for depositing titanium oxide films by atomic layer deposition, which may include a titanium nitride cap, an oxygen-rich titanium nitride cap, or a mixed oxide nitride layer. Additionally, it describes methods for self-aligned double patterning that include titanium oxide spacer films.

Career Highlights

Ghazal Saheli is currently employed at Applied Materials, Inc., where she continues to advance her research and development efforts in the field of materials science. Her innovative approaches have positioned her as a key player in the industry.

Collaborations

Ghazal has collaborated with notable colleagues such as Chien-Teh Kao and Benjamin Schmiege. These partnerships have further enhanced her research capabilities and contributed to her success in the field.

Conclusion

Ghazal Saheli is a trailblazer in atomic layer deposition technologies, with a focus on innovative methods that enhance material properties. Her contributions to the field are significant and continue to influence advancements in technology.