Santa Clara, CA, United States of America

Ghadeh Hadi

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Ghadeh Hadi: Innovator in Plasma Generation Quality Monitoring

Introduction

Ghadeh Hadi is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of plasma generation quality monitoring. His innovative approach has led to the development of a patented method that enhances the performance of plasma generating apparatuses.

Latest Patents

Ghadeh Hadi holds a patent for "Plasma generation quality monitoring using multi-channel sensor data." This method involves obtaining measurements from a calibrated feedback control device within a process chamber. It further includes determining performance indications of the plasma generating apparatus based on these measurements. The method also integrates data from multiple sensors to provide a comprehensive performance assessment, allowing for corrective actions to be taken when necessary.

Career Highlights

Hadi is currently employed at Applied Materials, Inc., where he applies his expertise in plasma technology. His work focuses on improving the efficiency and reliability of plasma processes, which are critical in various manufacturing applications.

Collaborations

Some of his coworkers include Jeremy Smith and Tao Zhang, who contribute to the collaborative environment at Applied Materials, Inc. Their combined efforts enhance the innovation and development of advanced technologies in the field.

Conclusion

Ghadeh Hadi's contributions to plasma generation quality monitoring exemplify the impact of innovative thinking in technology. His work not only advances the field but also sets a standard for future developments in plasma applications.

Profile summary based on public USPTO records.
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